Semiconductor device and process for fabrication thereof

ABSTRACT

A semiconductor chip is attached to a lead frame with a filmy organic die-bonding material having a water absorption of 1.5% by volume or less; having a saturation moisture absorption of 1.0% by volume or less, having a residual volatile component in an amount not more than 3.0% by weight, having a modulus of elasticity of 10 Mpa or less at a temperature of 259° C. The semiconductor device thus obtained can be free from occurrence of reflow cracks during reflow soldering for the packaging of semiconductor devices.

This application is a continuation of U.S. patent application Ser. No. 08/981702, filed Mar 31, 1998 now abandoned, which in turn is a 371 and corresponds to International Application No. PCT/JP96/01886, filed Jul. 8, 1996, which in turn is related to and claims the early filing date of Japanese Patent Application No. 7-171154, filed Jul. 6, 1995. The entire disclosures of the above applications are hereby incorporated by reference.

TECHNICAL FIELD

This invention relates to a semiconductor device having a support member such as a lead frame to which a semiconductor die or chip is attached using a die-bonding material and encapsulated with resin, and a process for the fabrication of such a semiconductor device.

BACKGROUND ART

As methods by which semiconductor chips are attached to lead frames, a method has been used in which a die-bonding material is fed onto the lead frame and the semiconductor chip is bonded thereto.

Such a die-bonding material is known to include, e.g., Au—Si eutectics, solders and resin pastes. Of these, Au—Si eutectics have problems in that they are expensive, have a high modulus of elasticity, and require vibration at the bonding portion. The solders have problems in that they can not withstand temperatures equal to or greater than their melting temperature and have a high modulus of elasticity.

As for the resin pastes, silver paste is the most commonly available. Compared with other materials, silver paste is inexpensive, has a high heat resistance reliability and has a low modulus of elasticity. Hence, they are most widely used as bonding materials for the lead frames of ICs and LSIs.

In recent years, there has been a rapid increase in demand for high-density packaging as electronic machinery has been made smaller in size and thickness. In semiconductor packaging, conventional pin insertion packaging has been substituted by surface packaging, which has become the prevailing packaging method suitable for high-density packaging.

In surface packaging, in order to directly solder leads to printed-wiring substrates, packaging is carried out by infrared reflowing, vapor phase reflowing or solder dipping while heating the whole package.

During this packaging, the whole package is exposed to high temperatures of 210° C. to 260° C. Hence, any presence of moisture in the package cause explosive vaporization of the moisture to cause package cracks (hereinafter “reflow cracks”).

Such reflow cracks may cause a great lowering of the reliability of semiconductor packages, bringing about a serious technical problem.

The mechanism by which reflow cracks ascribable to die-bonding materials occur is as follows: During storage of semiconductor packages, (1) die-bonding materials absorb moisture, (2) this moisture is vaporized upon heating when packaged by reflowing and soldering, and (3) vapor pressure thus produced causes breaking or separation of the die-bonding material layers, (4) so that the reflow cracks occur.

While reflow crack resistance of encapsulant has been improved, the reflow cracks ascribable to die-bonding materials provide a serious matter especially in thin-type packaging. Thus, it is strongly sought to improve its reflow crack resistance.

The silver paste, having been most commonly used, tends to cause reflow cracks because it has become difficult with the increase in size of chips to uniformly coat the silver paste on the whole surface requiring area and also because it is pasty itself and therefore tends to cause voids in bonding layers.

DISCLOSURE OF THE INVENTION

The present invention provides a semiconductor device that employs a filmy organic die-bonding material, may cause no reflow cracks and has good reliability, and a process for fabrication thereof.

In the present invention, a filmy organic die-bonding material is used. This filmy organic material is such a filmy material that is mainly made of an organic material such as epoxy resin, silicone resin, acrylic resin, or polyimide resin (including and organic material containing a metal filler or an inorganic material filler added thereto). The filmy organic die-bonding material which has been heated is contact-bonded to a support member such as a lead frame, and a semiconductor chip is placed on the filmy organic die-bonding material and heat is applied to bond the chip. More particularly, resin paste is provided in the form of a film so that die-bonding material is uniformly applied to the bonding portion.

FIG. 1 illustrates an example of a process for fabricating the semiconductor device of the present invention.

The filmy organic die-bonding material 1 is contact-bonded to a die pad 6 of a lead frame 5 on a heating platen 7 by means of a contact press ((b) in FIG. 1). The contact bonding may preferably be carried out under conditions of a temperature of from 200° C. to 250° C., a press time of from 0.1 second to 20 seconds and a pressure of from 4 gf/mm² to 200 gf/mm².

A semiconductor chip 8 is put on the filmy organic die-bonding material 1 stuck to the die pad 6, followed by heat contact bonding (i.e., die bonding) ((c) in FIG. 1). The die bonding may preferably be carried out under conditions of a temperature of from 100° C. to 350° C., a bonding time of from 0.1 second to 20 seconds and a pressure of from 0.1 gf/mm² to 30 gf/mm². More preferably conditions for die bonding are of a temperature of from 150° C. to 250° C., a bonding time of 0.1 (inclusive) second to 2 seconds and a pressure of 0.1 gf/mm² to 4 gf/mm², and the most preferable conditions for die bonding are of a temperature of from 150° C. to 250° C., a bonding rime of 0.1 (inclusive) second to 1.5 (exclusive) seconds and a pressure of 0.3 gf/mm² to 2 gf/mm².

Then, the step of wire bonding ((d) in FIG. 1 follows, and the step of encapsulating the semiconductor chip with resin ((e) in FIG. 1) further follows. Thus, the semiconductor device is produced. Reference numeral 9 denotes and encapsulant resin.

For example, the filmy organic die-bonding material of the present invention is prepared by dissolving or dispersing an organic material such as polyimide or epoxy resin and optionally and additive such as a metal filler in an organic solvent to obtains a coating varnish, coating this coating varnish on a carrier film such as biaxially stretched polypropylene film, followed by evaporation of the solvent, and peeling the filmy material from the carrier film. When prepared in this way, a film having self-supporting properties can be obtained.

The present inventors have discovered that the occurrence of reflow cracks in semiconductor device correlates with the properties or characteristics of the filmy organic die-bonding material, and have made detailed studies on the relationship between the occurrence of reflow cracks and the characteristics of the filmy organic die-bonding material. As a result, they have accomplished the present invention.

According to a first embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and encapsulated with resin, a filmy organic die-bonding material having a water absorption of 1.5% by volume or less is used as the die-bonding material.

According to a second embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material having a saturation moisture absorption of 1.0% by volume or less is used as the die-bonding material.

According to a third embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material having a residual volatile component in an amount not more than 3.0% by weight is used as the die-bonding material.

According to a fourth embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material having a modulus of elasticity of 10 Mpa or less at a temperature of 250° C. is used as the die-bonding material.

According to a fifth embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material having, at the stage where the semiconductor chip is bonded to the support member, a void volume of 10% or less in terms of voids present in the die-bonding material and at the interface between the die-bonding material and the support member is used as the die-bonding material.

According to a sixth embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material having a peel strength of 0.5 Kgf/5×5 mm chip or above at the stage where the semiconductor chip is bonded to the support member is used as the die-bonding material.

According to a seventh embodiment of the present invention, the semiconductor device and the process for its fabrication are characterized in that, in the semiconductor device having a support member to which a semiconductor chip is attached using a die-bonding material and then encapsulated with resin, a filmy organic die-bonding material i) having a planar dimension not larger than the planar dimension of the semiconductor chip, and ii) not protruding outward from the region of the semiconductor chip (i.e., not to protrude from the interface between the semiconductor chip and the support member) at the stage where the semiconductor chip is bonded to the support member is used as the die-bonding material.

In the embodiments of the present invention, the values of the properties or characteristics of the filmy organic die-bonding materials, such as a water absorption of 1.5% by volume or less, a saturation moisture absorption of 1.0% by volume or less, a residual volatile component in an amount not more than 3.0% by weight, or a modulus of elasticity of 10 MPa or less at a temperature of 250° C., are the values measured at the stage before the filmy organic die-bonding material is stuck onto the support member.

The filmy organic die-bonding material used in the first embodiment of the present invention, having a water absorption of 1.5% by volume or less, the filmy organic die-bonding material used in the second embodiment of the present invention, having a saturation moisture absorption of 1.0% by volume or less, the filmy organic die-bonding material used in the fourth embodiment of the present invention, having a modulus of elasticity of 10 MPa or less at a temperature of 250° C., and the filmy organic die-bonding material used in the sixth embodiment of the present invention, having a peel strength of 0.5 Kgf/5×5 mm chip or above at the stage where the semiconductor chip is bonded to the support member, can be produced by controlling composition of the filmy organic die-bonding material, e.g., the structure of polymers such as polyimide and the content of fillers such as silver.

The filmy organic die-bonding material used in the third embodiment of the present invention, having a residual volatile component in an amount not more than 3.0% by weight, and the filmy organic die-bonding material used in the fifth embodiment of the present invention, having, at the stage where the semiconductor chip is bonded to the die-bonding material, a void volume of 10% or less in terms of voids present in the die-bonding material and at the interface between the die-bonding material and the support member, can be produced by controlling the conditions for producing the filmy organic die-bonding material, e.g., drying temperature, drying time and so forth.

The semiconductor chip includes commonly available semiconductor chips of ICs, LSIs, VLSIs and so forth, any of which may be used. The die bonding materials according to the present invention is suitably used for the semiconductor chip as large a 5×5 mm or larger. The support member includes lead frames having die pads, ceramic wiring boards and glass-polyimide wiring boards, any of which may be used. FIG. 3 shows a plan view of an example of lead frames having die pads. The lead frame 40 shown in FIG. 3 has die pads 41.

As the filmy organic die-bonding material, not only those having single-layer structure but also those having multi-layer structure may be used.

In the present invention, the filmy organic die-bonding material may have at the same time two or more properties or characteristics of those described above.

For example, properties or characteristics the filmy organic die-bonding material may preferably have at the same time are as follows;

(1) A filmy organic die-bonding material having a saturation moisture absorption of 1.0% by volume or less and a residual volatile component in an amount not more than 3.0% by weight;

(2) A filmy organic die-bonding materiel having a saturation moisture absorption of 1.0% by volume or less, and a peel strength of 0.5 Kgf/5×5 mm chip or above at the stage where the semiconductor chip is bonded to the support member;

(3) A filmy organic die-bonding material having a residual volatile component in an amount not more than 3.0% by weight and a peel strength of 0.5 Kgf/5×5 mm chip or above at the stage where the semiconductor chip is bonded to the support member, and

(4) A filmy organic die-bonding material having a saturation moisture absorption of 1.0% by volume or less, a residual volatile component in an amount not more than 3.0% by weight, and a peel strength of 0.5 Kgf/5×5 mm chip or above at the stage where the semiconductor chip is bonded to the support member.

In the present invention, the foregoing properties or characteristics of the filmy organic die-bonding material may be in any combination in accordance with the purposes for which it is used.

The above (1) to (4) filmy organic die-bonding materials or the filmy organic die-bonding materials having the above properties or characteristics in any other combinations may preferably be used as filmy organic die bonding materials each i) having a planar dimension not larger than the planar dimension of the semiconductor chip, and ii) not protruding outward from the region of the semiconductor chip at the stage where the semiconductor chip is bonded to the support member.

The semiconductor device of the present invention is free from reflow cracks which might otherwise occur during reflow soldering for the packaging of semiconductor devices, and has good reliability.

As the organic material constituting the filmy organic die-bonding material of the present invention, polyimide resin is preferred,

Tetracarboxylic dianhydrides used as starting materials for the polyimide resin include:

1,2-(ethylene)bis(trimellitate anhydride),

1,3-(trimethylene)bis(trimellitate anhydride),

1,4-(tetramethylene)bis(trimellitate anhydride),

1,5-(pentamethylene)bis(trimellitate anhydride),

1,6-(hexamethylene)bis(trimellitate anhydride),

1,7-(heptamethylene)bis(trimellitate anhydride),

1,8-(octamethylene)bis(trimellitate anhydride),

1,9-(nonamethylene)bis(trimellitate anhydride),

1,10-(decamethylene)bis(trimellitate anhydride),

1,12-(dodecamethylene)bis(trimellitate anhydride),

1,16-(hexadecamethylene)bis(trimellitate anhydride),

1,18-(octadecamethylene)bis(trimellitate anhydride), pyromellitic dianhydride,

3,3′,4,4′-diphenyltetracarboxylic dianhydride,

2,2′,3,3′-diphenyltetracarboxylic dianhydride,

2,2-bis(3,4-dicarboxyphenyl)propone dianhydride,

2,2-bis(2,3-dicarboxyphenyl)propane dianhydride,

1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride,

1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride,

bis(2,3-dicarboxyphenyl)methane dianhydride,

bis(3,4-dicarboxyphenyl)methane dianhydride,

bis(3,4-dicarboxyphenyl)sulfone dianhydride,

3,4,9,10-perylenetetracarboxylic dianhydride,

bis(3,4-dicarboxyphenyl)ether dianhydride,

benzene-1,2,3,4-tetracarboxylic dianhydride,

3,4,3′,4′-benzophenonetetracarboxylic dianhydride,

2,3,2′,3′-benzophenonetetracarboxylic dianhydride,

2,3,3′,4′-benzophenonetetracarboxylic dianhydride,

1,2,5,6-naphthalenetetracarboxylic dianhydride,

2,3,6,7-naphthalenetetracarboxylic dianhydride,

1,2,4,5-naphthalene-tetracarboxylic dianhydride,

1,4,5,6-naphthalene-tetracarboxylic dianhydride,

2,6-dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride,

2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride,

2,3,6,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic dianhydride,

phenanthrene-1,8,9,10-tetracarboxylic dianhydride,

pyrazine-2,3,5,6-tetracarboxylic dianhydride,

thiophene-2,3,4,5-tetracarboxylic dianhydride,

2,3,3′,4′-biphenyltetracarboxylic dianhydride,

3,4,3′,4′-biphenyltetracarboxylic dianhydride,

2,3,2′,3′-biphenyltetracarboxylic dianhydride,

bis(3,4-dicarboxyphenyl)dimethylsilane dianhydride,

bis(3,4-dicarboxyphenyl)methylphenylsilane dianhydride,

bis(3,4-dicarboxyphenyl)diphenylsilane dianhydride,

1,4-bis(3,4-dicarboxyphenyldimethylsilyl)benzene dianhydride,

1,3-bis(3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldicyclohexane dianhydride

p-phenylenebis(trimellitate anhydride),

ethylenetetracarboxylic dianhydride,

1,2,3,4-butanetetracarboxylic dianhydride,

decahydronaphthalene-1,4,5,8-tetracarboxylic dianhydride,

4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic dianhydride,

cyclopentane-1,2,3,4-tetracarboxylic dianhydride,

pyrrolidine-2,3,4,5-tetracarboxylic dianhydride,

1,2,3,4-cyclobutanetetracarboxylic dianhydride,

bis(exo-bicyclo[2,2,1]heptane-2,3-dicarboxylic dianhydride)sulfone,

bicyclo-(2,2,2)-octo-7-ene-2,3,5,6-tetracarboxylic dianhydride,

2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride,

2,2-bis(4-(3,4-dicarboxyphenoxy)phenyl)hexafluoropropane dianhydride,

4,4′-bis(3,4-dicarboxyphenoxy)diphenylsulfide dianhydride,

1,4-bis(2-hydroxyhexafluoroisopropyl)benzenebis(trimellitic anhydride),

1,3-bis(2-hydroxyhexafluoroisopropyl)benzenebis(trimellitic anhydride),

5-(2,5-dioxotetrahydrofuril)-3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride, and

tetrahydrofuran-2,3,4,5-tetracarboxylic dianhydride.

Any of these may be used in the form of a mixture of two or more kinds.

Diamines used as starting materials for the polyimide resin include aromatic diamines such as:

o-phenylenediamine,

m-phenylenediamine,

p-phenylenediamine,

3,3′-diaminodiphenyl ether,

3,4′-diaminodiphenyl ether,

4,4′-diaminodiphenyl ether,

3,3′-diaminodiphenylmethane,

3,4′-diaminodiphenylmethane,

4,4′-diaminodiphenylmethane,

bis(4-amino-3,5-dimethylphenyl)methane,

bis(4-amino-3,5-diisopropylphenyl)methane,

3,3′-diaminodiphenyldifluoromethane,

3,4′-diaminodiphenyldifluoromethane,

4,4′-diaminodiphenyldifluoromethane,

3,3′-diaminodiphenyl sulfone,

3,4′-diaminodiphenyl sulfone,

4,4′-diaminodiphenyl sulfone,

3,3′-diaminodiphenyl sulfide,

3,4′-diaminodiphenyl sulfide,

4,4′-diaminodiphenyl sulfide,

3,3′-diaminodiphenyl ketone,

3,4′-diaminodiphenyl ketone,

4,4′-diaminodiphenyl ketone,

2,2-bis(3-aminophenyl)propane,

2,2′-(3,4′-diaminodiphenyl)propane,

2,2-bis(4-aminophenyl)propane,

2,2-bis(3-aminophenyl)hexafluoropropane,

2,2-(3,4′-diaminodiphenyl)hexafluoropropane,

1,2-bis(4-aminophenyl)hexafluoropropane,

1,3-bis(3-aminophenoxy)benzene,

1,4-bis(3-aminophenoxy)benzene,

1,4-bis(4-aminophenoxy)benzene,

3,3′-(1,4-phenylenebis(1-methylethylidene))bisaniline

3,4′-(1,4-phenylenebis(1-methylethylidene))bisaniline

4,4′-(1,4-phenylenebis(1-methylethylidene))bisaniline

2,2-bis(4-(3-aminophenoxy)phenyl)propane,

2,2-bis(4-(4-aminophenoxy)phenyl)propane,

2,2-bis(4-(3-aminophenoxy)phenyl)hexafluoropropane,

2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane,

bis(4-(3-aminophenoxy)phenyl)sulfide,

bis(4-(4-aminophenoxy)phenyl)sulfide,

bis(4-(3-aminophenoxy)phenyl)sulfone, and

bis(4-(4-aminophenoxy)phenyl)sulfone;

and aliphatic diamines such as:

1,2-diaminoethane,

1,3-diaminopropane,

1,4-diaminobutane,

1,5-diaminopentane,

1,6-diaminohexane,

1,7-diaminoheptane,

1,8-diaminooctane,

1,9-diaminononane,

1,10-diaminodecane,

1,11-diaminoundecane, and

1,12-diaminododecane.

Any of these may be used in the form of a mixture of two or more kinds.

The polyimide can be obtained by subjecting the tetracarboxylic dianhydride and the diamine to condensation by a known method. More specifically, using the tetracarboxylic dianhydride and the diamine in substantially equimolar weights (the respective components may be added in any order), the reaction is carried out in an organic solvent at a reaction temperature of 80° C. or below, and preferably at 0° C. to 50° C. With the progress of the reaction, the viscosity of reaction mixture gradually increases, so that a polyimide precursor polyamic acid is formed.

The polyimide can be obtained by dehydration ring closure of the above reaction product (polyamic acid). The dehydration ring closure may be carried out by a method of heat treatment at 120° C. to 250° C. or by a chemical method.

Epoxy resin of glycidyl ether type, glycidylamine type, glycidyl ester type or alicyclic type may be used as organic materials for the filmy organic die-bonding materials of the present invention.

As mentioned above, in the process for the fabrication of a semiconductor device according to the present invention, the die bonding may preferably be carded out under conditions of a temperature of from 100° C. to 350° C., a bonding time of from 0.1 second to 20 seconds and a pressure of from 0.1 gf/mm² to 30 gf/mm². More preferably, it is carried out under conditions of a temperature of from 150° C. to 250° C., a bonding time of 0.1 (inclusive) second to 2 seconds and a pressure of 0.1 gf/mm² to 40 gf/mm², and the most preferably, under conditions of from 150° C. to 250° C., a bonding time of 0.1 (inclusive) second to 1.5 (exclusive) seconds and a pressure of 0.3 gf/mm² to 2 gf/mm².

When a filmy organic die-bonding material whose elastic modulus at a temperature of 250° C. Is not more than 10 MPa is used, a sufficient peel strength (for example, 0.5 Kgf/5×5 mm chip or more) can be obtained by carrying out die-bonding under conditions of a temperature of from 150° C. to 250° C., a bonding time of 0.1 (inclusive) second to 2 seconds and a pressure of 0.1 gf/mm² to 4 gf/mm².

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 cross-sectionally illustrates an example of a process for fabricating the semiconductor device of the present invention.

FIG. 2 is a front elevation used to describe a method for measuring peel strength by using a push-pull gauge.

FIG. 3 is a plan view of an example of lead frames having a die pads.

BEST MODE FOR CARRYING OUT THE INVENTION

The present invention will be described below in greater detail by giving Examples, but an embodiment of the present invention is not limited to these examples. All of polyimides used in the following examples are obtained by heating the mixture of acid dianhydride, with diamine being the same mol as the acid dianhydride, in solvent, so as to polymerize them. In the following examples, polyimide A is a polyimide synthesized from 1,2-(ethylene)bis(trimellitate anhydride) and bis(4-amino-3,5-dimethylphenyl)methane; polyimide B is a polyimide synthesized from 1,2-(ethylene)bis(trimellitate anhydride) and 4,4′-diaminodiphenylether; polyimide C is a polyimide synthesized from 1,2-ethylene)bis(trimellitate anhydride) and bis(4-amino-3,5-diisopropylphenyl)methane; polyimide D is a polyimide synthesized from 1,2-(ethylene)bis(trimellitate anhydride) and 2,2-bis[4-(4-aminophenoxy)phenyl] propane; polyimide E is a polyimide synthesized from a mixture of 1,2-(ethylene)bis(trimellitate anhydride) and 1,10-(decamethylene)bis(trimellitate anhydride) being the same mol as the mixture, and 2,2-bis[4-(4-aminophenoxy)phenyl] propane; polyimide F is a polyimide synthesized from 1,10-(decamethylene)bis(trimellitate anhydride) and 2,2-bis[4-(4-aminophenoxy)phenyl]propane.

EXAMPLE 1

To 100 g of each polyimide shown in Table 1 and 10 g of epoxy resin, 280 g of an organic solvent was added to make a solution. To the solution obtained, silver powder was added in a stated amount, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by drying in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials having the composition and water absorption as shown in Table 1 were prepared.

The filmy organic die-banding materials as shown in Table 1 were each stuck onto the tab of the lead frame while heating at 180° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 300° C., a pressure of 12.5 gf/mm2 and a bonding time of 5 seconds, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP (Quad Flat Package) package: 14×20×1.4 mm; chip size: 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, and thereafter heated at 240° C. for 10 seconds in an IR (infrared) reflow furnace.

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 1.

TABLE 1 Rate of Composition of film Water occurrence of Ag content absorption reflow cracks No. Polyimide (wt. %) (%) (%) 1 Polyimide A 80 2.0 100 2 Polyimide B 80 1.9 100 3 Polyimide C 80 1.8 100 4 Polyimide D 52 1.5 0 5 Polyimide E 60 1.2 0 6 Polyimide E 0 1.0 0 7 Polyimide F 60 0.9 0 8 Polyimide F 0 0.8 0 9 Polyimide F 40 0.7 0 10 Polyimide F 80 0.4 0 Comparative Example: 1.7 100 Silver paste* *As the silver paste, EPINAL (trade name; available from Hitachi Chemical Co., Ltd.) was used.

Measurement of Water Absorption

A film with a size of 50×50 mm is used as a sample. The sample is dried at 120° C. for 3 hours in a vacuum dryer, and then left to cool in a desiccator. Thereafter, the dried weight of the sample is measured and is regarded as M1. The sample is immersed in distilled water at room temperature for 24 hours, and then taken out. The surface of the sample is wiped with filter paper and its weight is immediately measured and is regarded as M2.

The water absorption is calculated according to the following:

[(M2−M1)/(M1/d)]×100=Water absorption (vol. %)

wherein d is the density of the filmy organic die-bonding material.

EXAMPLE 2

To 100 g of each polyimide shown in Table 2 and 10 g of epoxy resin, 280 g of an organic solvent was added to make a solution. To the solution obtained, silver powder was added in a stated amount, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by drying in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials having the composition and saturation moisture absorption as shown in Table 2 were prepared.

The filmy organic die-bonding materials as shown in Table 2 were each stuck onto the tab of the lead frame while heating at 160° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 300° C., a pressure of 12.5 gf/mm2 and a bonding time of 5 seconds in examples No. 1 to 6 and the comparative example, and under conditions of a temperature of 230° C., a pressure of 0.8 gf/mm2 and a bonding time of 1 second in examples No. 7 to 10, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP package: 14×20×1.4 mm; chip size: 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, end thereafter heated at 240° C. for 10 seconds in an IR reflow, furnace.

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 2.

TABLE 2 Saturation Rate of Composition of film moisture occurrence of Ag content absorption reflow cracks No. Polyimide (wt. %) (%) (%) 1 Polyimide A 80 1.7 100 2 Polyimide B 80 1.5 100 3 Polyimide C 80 1.4 100 4 Polyimide D 80 1.0 0 5 Polyimide D 60 0.8 0 6 Polyimide D 40 0.6 0 7 Polyimide F 0 0.5 0 8 Polyimide F 60 0.4 0 9 Polyimide F 52 0.3 0 10 Polyimide F 40 0.2 0 Comparative Example: 1.2 100 Silver paste* *As the silver paste, EPINAL (trade name; available from Hitachi Chemical Co., Ltd.) was used.

Measurement of Saturation Moisture Absorption

A circular filmy organic die-bonding material of 10 mm diameter is used as a sample. The sample is dried at 120° C. for 3 hours in a vacuum dryer, and then left to cool in a desiccator. Thereafter, the dried weight of the sample is measured and is regard as M1. The sample is moisture-absorbed in a thermo-hygrostat of 85° C. and 85%RH, and then taken out. Its weight is immediately measured until the values of weight become constant. This weight is regarded as M2.

The saturation moisture absorption is calculated according to the following:

((M2−M1)/(M1/d))×100=saturation moisture absorption (vol. %)

wherein d is the density of the filmy organic die-bonding material.

EXAMPLE 3

To 100 g of polyimide F and 10 g of epoxy resin, 140 g of dimethylacetamide and 140 g of cyclohexanone were added as organic solvents to make a solution. To the solution obtained, 74 g of silver powder was added, followed by thorough stirring so as to be homogenously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by heating at temperatures of from 80° C. to 120° C. in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials having the residual volatile component as shown in Table 3 were prepared. Here, when the drying temperature was higher than 120° C., the coating was dried on the OPP film at 80° C. for 30 minutes, and thereafter the resulting filmy organic die-bonding material was peeled from the OPP film, which was then held on an iron frame, and again heated in the dryer to dry it.

The filmy organic die-bonding materials as shown in Table 3 were each stuck onto the tab of the lead frame while heating at 160° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 230° C., a pressure of 0.6 gf/mm2 and a bonding time of 1 second, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP package: 14×20×1.4 mm; chip size: 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, and thereafter heated at 240° C. for 10 seconds in an IR reflow furnace.

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 3.

TABLE 3 Rate of Residual occurrence Drying Drying volatile of reflow temp. time component Voids in cracks No. (C.°) (min) (wt. %) film (%) 1 80 30 6.5 Present 100 2 100 2 4.9 Present 100 3 100 4 4.2 Present 100 4 100 10 3.8 Present 80 5 100 30 3.5 Present 60 6 120 10 3.0 None 0 7 120 75 2.2 None 0 8 140 10 2.0 None 0 9 160 10 1.5 None 0 10 140 60 1.2 None 0 11 160 30 0.7 None 0 Comparative Example: 15.0 Present 100 Silver paste* *As the silver paste, EPINAL (trade name; available from Hitachi Chemical Co., Ltd.) was used.

Measurement of Residual Volatile Component

A filmy organic die-bonding material with a size of 50×50 mm is used as a sample. The weight of the sample is measured and is regarded as M1. The sample is heated at 200° C. for 2 hours in a hygrostat with internal air circulation, and thereafter its weight is immediately measured and is regarded as M2.

The residual volatile component is calculated according to the following:

[(M2−M1)/M1]×100 a residual volatile component (wt. %)

EXAMPLE 4

To 100 g of polyimide D and 10 g of epoxy resin, 140 g of dimethylacetamide and 140 g of cyclohexanone were added as organic solvents to make a solution. To the solution obtained, 74 g of silver powder was added, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by heating at temperatures of from 80° C. to 120° C. In a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials having the void volume as shown in Table 4 were prepared. Here, when the drying temperature was higher than 120° C., the coating was dried on the OPP film at 80° C. for 30 minutes, and thereafter the resulting filmy organic die-bonding material was peeled from the OPP film, which was then held on an iron frame, and again heated in the dryer to dry it.

Herein, the void volume refers to a void volume in terms of voids present In the die-bonding material and at the interface between the die-bonding material and the support member at the stage where the semiconductor chip is bonded to the support member.

The filmy organic die-bonding materials as shown in Table 4 were each stuck onto the tab of the lead frame while heating at 180° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 300° C., a pressure of 12.5 gf/mm2 and a bonding time of 5 seconds, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP package: 14×20×1.4 mm; chip size: 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, and thereafter heated at 240° C. for 10 seconds in an IR reflow furnace.

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 4.

TABLE 4 Drying Drying Rate of occurrence of temp. time Void volume reflow cracks No. (C.°) (min) (wt. %) (%) 1 50 30 30 100 2 100 2 22 100 3 100 10 17 80 4 120 10 10 0 5 120 75 7 0 6 140 10 5 0 7 160 30 0 0 Comparative Example: 40 100 Silver paste* *As the silver paste, EPINAL (trade name; available from Hitachi Chemical Co., Ltd.) was used.

Measurement of Void Volume

A silicone chip is bonded to a lead frame using the filmy organic die-banding material to make a sample. A photograph of a top view of the sample is taken using a soft X-ray device. The area percentage of voids in the photograph is measured using an image analyzer, and the area percentage of the voids seen through the sample from its top is regarded as void volume (%).

EXAMPLE 5

To 100 g of each polyimide shown in Table 5 and 10 g of epoxy resin, 280 g of an organic solvent was added to make a solution. To the solution obtained, silver powder was added in a stated amount, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by drying in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials having the composition and peel strength as shown in Table 5 were prepared.

Herein, the peel strength refers to the peel strength of the filmy organic die-bonding material at the stage where the semiconductor chip is bonded to the support member through the filmy organic die-bonding material.

The filmy organic die-bonding materials as shown in Table 5 were each stuck onto the tab of the lead frame while heating at 160° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 300° C., a pressure of 12.5 gf/mm2 and a bonding time of 5 seconds with respect to examples No. 1 to 5, and conditions of a temperature of 230° C., a pressure of 0.6 gf/mm2 and a bonding time of 1 second with respect to examples No. 6 to 10, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP package: 14×20×1.4 mm; chip size: 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, and thereafter heated at 240° C. for 10 seconds in an IR reflow furnace,

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 5.

TABLE 5 Peel Rate of Composition of film strength occurrence of Ag content (Kgf/ reflow cracks No. Polyimide (wt. %) 5 × 5 mm chip) (%) 1 Polyimide B 80 0.2 100 2 Polyimide C 80 0.3 100 3 Polyimide A 80 0.4 80 4 Polyimide D 80 0.5 0 5 Polyimide F 80 0.7 0 6 Polyimide F 0 0.8 0 7 Polyimide F 30 1.0 0 8 Polyimide F 20 1.5 0 9 Polyimide F 40 >2.0 0 10 Polyimide F 52 >2.0 0

Method of Measuring a Peel Strength

On a support member, such as a tab surface of a lead frame, for supporting semiconductor chips, a silicone chip (test piece) of 5×5 mm was attached by laying a filmy organic die-bonding materials therebetween. The chip-attached support member was held on a heating platen heated at a temperature of 240° C. for 20 seconds. As shown in FIG. 2, a peel strength was measured by a push-pull gauge at a test speed of 0.5 mm/minute. In FIG. 2, reference numeral 21 represents a semiconductor chip, 22 represents a filmy organic die-bonding material, 23 represents a lead frame, 24 represents the push-pull gauge, 25 represents the heating platen. In this case, the test piece was held at a temperature of 240° C. for 20 seconds, but in a case where a semiconductor device is packaged at a different temperature depending on its purpose, the measurement must be performed at the temperature.

EXAMPLE 6

To 100 g of polyimide E and 10 g of epoxy resin, 280 g of an organic solvent was added to make a solution. To the solution obtained, silver powder was added in a stated amount, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by drying in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials were prepared.

The filmy organic die-bonding materials, having the size as shown in Table 8, were each stuck onto the tab of the lead frame while heating at 180° C. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions of a temperature of 300° C., a pressure of 12.5 gf/mm2 and a bonding time of 5 seconds, followed by wire bonding and then molding with an encapsulant material (trade name CEL-9000, available from Hitachi Chemical Co., Ltd.). Thus, a semiconductor device was fabricated (QFP package: 14×20×1.4 mm; chip size; 8×10 mm; 42 alloy lead frame).

The semiconductor device having been thus encapsulated was treated in a thermo-hygrostat of 85° C. and 85%RH for 168 hours, and thereafter heated at 240° C. for 10 seconds in an IR reflow furnace.

Thereafter, the semiconductor device was molded with polyester resin, and then cut with a diamond cutter to observe its cross section on a microscope. Rate (%) of occurrence of reflow cracks was measured according to the following expression to make evaluation on the reflow crack resistance.

(Number of occurrence of reflow cracks/number of tests)×100=rate (%) of occurrence of reflow cracks.

The results of evaluation are shown in Table 6.

TABLE 6 Planar Rate of dimen- Planar Out- occurrence Film sion of Chip dimen- ward of reflow size film size sion of protru- cracks No. (mm) (mm²) (mm) chip sion (%) 1 11 × 13  143 8 × 10 80 Yes 100 2 10 × 12  123 8 × 10 80 Yes 100 3  9 × 11 99 8 × 10 80 Yes 100 4  9 × 10 90 8 × 10 80 Yes 70 5  8 × 11 88 8 × 10 80 Yes 60 6  8 × 10 80 8 × 10 80 No 0 7 8 × 9 72 8 × 10 80 No 0 8  7 × 10 70 8 × 10 80 No 0 9 8 × 9 72 8 × 10 80 No 0 10 6 × 8 48 8 × 10 80 No 0 11 5 × 7 35 8 × 10 80 No 0 12 4 × 6 24 8 × 10 80 No 0 13 3 × 5 15 8 × 10 80 No 0 14 2 × 4 8 8 × 10 80 No 0

EXAMPLE 7

To 100 g of polyimide F and 10 g of epoxy resin, 280 g of an organic solvent was added to make a solution. To the solution obtained, silver powder was added in a stated amount, followed by thorough stirring so as to be homogeneously dispersed, to obtain a coating varnish.

This coating varnish was coated on a carrier film (OPP film; biaxially stretched polypropylene), followed by drying in a dryer with internal air circulation to cause the solvent to evaporate and dry the varnish. Thus, filmy organic die-bonding materials were prepared.

The filmy organic die-bonding materials, having the modulus of elasticity at a temperature of 250° C. as shown in Table 7, were each stuck onto the tab of the lead frame while heating at 160%,. On the lead frame to which the filmy organic die-bonding material was thus stuck, a semiconductor chip was mounted by die bonding carried out under conditions shown in Table 7.

TABLE 7 Film Conditions Composition of film modulus of Temper- Pres- Peel Ag content elastic ature sure strength No. Polyimide (wt %) (MPa) (° C.) (gf/mm²) (Kgf/5 × 5 mm chip) 1 Polyimide F 60 0.2 230 2.0 >2.0 2 Polyimide F 40 0.3 230 2.0 >2.0 3 Polyimide F 0 0.4 230 2.0 0.8

Method of Measuring a Film Modulus of Elasticity (MPa)

By using RHEOLOGRAPH OF SOLID S type, available from Kabushiki Kaisha Toyoseiki Seisakusho, a dynamic viscoelasticity was measured at a heating speed of 5° C./minute and a frequency of 10 Hz. A storage modulus E′ at a temperature of 250° C. was regarded as the modulus of elasticity.

Method of Measuring a Peel Strength

It is as same as that of Example 5. 

What is claimed is:
 1. A method of manufacturing a semiconductor device, comprising the steps of: forming a patterned masking layer of insulating material at a surface of a semiconductor body, etching the semiconductor body through the patterned masking layer so as to form a trench in the semiconductor body, applying an insulating layer which fills the trench in the semiconductor body, the insulating layer exhibiting a trough above the trench, which trough has a bottom area lying substantially above the surface of the semiconductor body, subjecting the semiconductor body to a planarizing treatment so as to form a substantially planar surface, subjecting the semiconductor body to a further treatment so as to expose the semiconductor body and form a field isolating region, wherein the insulating layer is removed substantially to the bottom area of the trough by means of chemical mechanical polishing (CMP) using fixed abrasives in a CMP polishing paid during the planarizing treatment.
 2. A method as claimed in claim 1, characterized in that the patterned masking layer (3) is left at the surface (2) of the semiconductor body (1) after formation of the trench(R), the patterned masking layer (3) is formed of a material with respect to which the insulating layer (10) is not substantially selectively removable during the planarizing treatment.
 3. A method as claimed in claim 2, characterized in that the patterned masking layer (3) is removed over at most a part of its thickness during the planarizing treatment.
 4. A method as claimed in claim 1, characterized in that the patterned masking layer (3) is applied by depositing a layer comprising silicon oxynitride, which the insulating layer (10) is applied by depositing a layer comprising high-density plasma silicon oxide.
 5. A method as claimed in claim 1, characterized in that the patterned masking layer (3) is applied with a pad oxide layer (4) as the lowermost layout.
 6. The method according to claim 1, wherein the planning step does not include the use of a stop layer to erode more slowly than the insulating layer. 